This inventor holds 1 USPTO granted patent. Top assignee: Evonik Operations Gmbh. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jia Wen Hah - Innovator in Self-Cleaning Coating Technology
Introduction
Jia Wen Hah is a notable inventor based in Singapore, recognized for her innovative contributions to coating technologies. With a focus on self-cleaning solutions, she has developed a unique coating composition that showcases her expertise in materials science.
Latest Patents
Jia Wen Hah holds a patent for a self-cleaning coating composition. This composition consists of 5-15% by weight of a polymeric binder, which can be selected from various materials such as polyester polyol, acrylic polyol, epoxy, silicone, silicone hybrid, and fluoropolymer. Additionally, the composition includes 20-40% by weight of microparticles made from polyamide, polyethylene, polypropylene, polyurea, polyurethane, polymethyl methacrylate, polystyrene, or mixtures thereof, with a mean particle diameter ranging from 5 μm to 60 μm. Furthermore, it contains 2-12% by weight of nanoparticles made of inorganic oxides with a primary particle size ranging from 5 nm to 50 nm, along with 0-15% by weight of a crosslinker, 0-20% by weight of pigments and/or fillers, and 40-80% by weight of an organic solvent.
Career Highlights
Jia Wen Hah is currently employed at Evonik Operations GmbH, where she continues to advance her research and development in innovative coating technologies. Her work has significantly contributed to the field, particularly in creating solutions that enhance the functionality and durability of surfaces.
Collaborations
Jia has collaborated with esteemed colleagues, including Yong Bing Chong and Kong Chin Chew, who have supported her endeavors in developing cutting-edge technologies.
Conclusion
Jia Wen Hah's contributions to the field of self-cleaning coatings exemplify her innovative spirit and dedication to advancing material science. Her patent reflects a significant step forward in creating more efficient and effective coating solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
