Suwon, South Korea

Ji Yup Kim

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji Yup Kim. Retrieved from https://idiyas.com/inventor/ji-yup-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ji Yup Kim

Introduction: Ji Yup Kim is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on photoresist compositions for extreme ultraviolet (EUV) lithography.

Latest Patents: Ji Yup Kim holds a patent for "Photoresist compositions for EUV and methods for manufacturing semiconductor devices using the same." This patent includes innovative photoresist compositions that consist of a photosensitive resin, a photoacid generator, and an additive. The additive features a copolymer with a first repeating unit that includes a fluoroalkyl group or a hydrocarbon group substituted with one or more fluoroalkyl groups, along with a second repeating unit that contains a sulfonic acid group and an amide group. He has 1 patent to his name.

Career Highlights: Ji Yup Kim is currently employed at Samsung Electronics Ltd., a leading company in the electronics and semiconductor industry. His expertise in photoresist compositions has positioned him as a key player in advancing semiconductor manufacturing processes.

Collaborations: Throughout his career, Ji Yup Kim has collaborated with talented individuals such as Juhyeon Park and JinJoo Kim. These collaborations have further enhanced his research and development efforts in the semiconductor field.

Conclusion: Ji Yup Kim's innovative work in photoresist compositions for EUV lithography showcases his significant contributions to semiconductor technology. His patent and collaborations reflect his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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