Hwaseong, South Korea

Ji Yu Shim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: University-Industry Cooperation Group of Kyung Hee University. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ji Yu Shim: Innovator in Photonic Annealing Technologies

Introduction

Ji Yu Shim is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of photonic annealing through his innovative methods and research. His work focuses on the development of advanced materials that enhance the efficiency of photonic processes.

Latest Patents

Ji Yu Shim holds a patent for a "Method for manufacturing ink for photonic annealing, and method for manufacturing surface-functionalized metal film." This patent describes a method of manufacturing an ink for photonic annealing, which includes the production of surface-modified metal nanoparticles and micron particles. The process involves using a first surface modifier for nanoparticles and a second surface modifier for micron particles. The final ink consists of a mixture where metal nanoparticles are adsorbed on the surface of the micron particles in a single layer, optimizing the performance of photonic annealing applications.

Career Highlights

Ji Yu Shim is affiliated with the University-Industry Cooperation Group of Kyung Hee University. His role in this group allows him to bridge the gap between academic research and industrial application, fostering innovation in material science and engineering.

Collaborations

Some of his notable coworkers include Sun Ho Jeong and Ye Jin Jo. Their collaborative efforts contribute to the advancement of research in photonic technologies and materials.

Conclusion

Ji Yu Shim's innovative work in photonic annealing and his contributions to material science highlight his importance as an inventor. His patent reflects a significant advancement in the field, showcasing the potential for future developments in photonic applications.

Profile summary based on public USPTO records.
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