Ji-Xuan Yang

Title: Ji-Xuan Yang: Innovator in Semiconductor Technology

Introduction

Ji-Xuan Yang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in the industry.

Latest Patents

Ji-Xuan Yang holds a patent titled "Multigate device structure with engineered cladding and method making the same." This patent outlines a method for creating a semiconductor device, which includes forming a semiconductor stack on a substrate. The stack consists of alternating layers of first and second semiconductor materials. The process involves patterning the semiconductor stack and substrate to create a trench and an adjacent active region. Additionally, it details the steps of epitaxially growing a liner of the first semiconductor material, forming an isolation feature, and converting the liner into a silicon nitride layer, followed by the formation of a cladding layer of the second semiconductor material.

Career Highlights

Ji-Xuan Yang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to contribute to cutting-edge technology and innovation in semiconductor manufacturing.

Collaborations

Throughout his career, Ji-Xuan Yang has collaborated with notable colleagues, including Shu-Wen Shen and Jiun-Ming Kuo. These collaborations have fostered a productive environment for innovation and have led to advancements in semiconductor technology.

Conclusion

Ji-Xuan Yang's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor. His innovative methods and collaborative efforts continue to shape the future of the semiconductor industry.