This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Pohang University of Science and Technology Foundation, The University of Hong Kong, Versitech, Inc.. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2023-2026
Title: Ji Tae Kim: Innovator in Microfluidic Reactor Technology
Introduction
Ji Tae Kim is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of chemical engineering, particularly in the development of microfluidic reactors. With a total of 2 patents, his work focuses on enhancing the control of chemical reactions through innovative technologies.
Latest Patents
Ji Tae Kim's latest patents include a microfluidic reactor designed for controlling chemical reactions and a method for controlling ultrafast chemical reactions using a microfluidic reactor fabricated by high-resolution 3D metal printing techniques. The first patent provides a microfluidic reactor capable of controlling chemical reactions on an expanded scale, along with a corresponding chemical reaction control method. The second patent addresses the control of ultrafast chemical reactions, such as the Fries rearrangement reaction, utilizing advanced 3D metal printing techniques.
Career Highlights
Throughout his career, Ji Tae Kim has worked with notable organizations, including the Pohang University of Science and Technology Foundation and Versitech, Inc. His experience in these institutions has allowed him to refine his expertise in microfluidic technologies and chemical engineering.
Collaborations
Ji Tae Kim has collaborated with talented individuals such as Dong Pyo Kim and Hyune Jea Lee. These partnerships have contributed to the advancement of his research and innovations in the field.
Conclusion
Ji Tae Kim stands out as an influential inventor in the realm of microfluidic reactor technology. His innovative patents and collaborative efforts continue to push the boundaries of chemical engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile