Busan, South Korea

Ji-Tae Ha

This inventor holds 1 USPTO granted patent. Top assignee: D3D Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji-Tae Ha. Retrieved from https://idiyas.com/inventor/ji-tae-ha-1f7s2sbw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ji-Tae Ha: Innovator in Clothing Design Technology

Introduction

Ji-Tae Ha is a prominent inventor based in Busan, South Korea. He has made significant contributions to the field of clothing design through his innovative patent. His work focuses on enhancing the efficiency and accuracy of clothing design similarity determination.

Latest Patents

Ji-Tae Ha holds a patent for a "Clothing design similarity determination system and method." This invention provides a comprehensive approach to determining the similarity of clothing designs. The method includes several steps: collecting image data about clothing, removing unnecessary parts from the collected data, processing the features of the clothing, storing the processed data in a database, and finally calculating the similarity of clothing designs using artificial intelligence. This innovative work was supported by a project for Smart Manufacturing Innovation R&D funded by the Korea Ministry of SMEs and Startups.

Career Highlights

Ji-Tae Ha is currently employed at D3D Co., Ltd., where he continues to develop and refine his innovative ideas. His dedication to advancing clothing design technology has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including Eun-mi Oh and Hyo-Jung Chang, who contribute to the innovative environment at D3D Co., Ltd.

Conclusion

Ji-Tae Ha's contributions to clothing design technology through his patent demonstrate his commitment to innovation in the field. His work not only enhances design processes but also showcases the potential of artificial intelligence in fashion.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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