Gansu, China

Ji Qi

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Chinese Academy of Sciences. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji Qi. Retrieved from https://idiyas.com/inventor/ji-qi-em96b0bb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2026

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2 patents (USPTO):Explore Patents

Title: Ji Qi - Innovator in Particle Flow Simulation Technology

Introduction

Ji Qi is a notable inventor based in Gansu, China. He has made significant contributions to the field of particle flow simulation technology. His innovative work focuses on enhancing computational efficiency while minimizing power consumption.

Latest Patents

Ji Qi holds a patent for a "Particle flow simulation system and method." This invention provides a GPU-based particle flow simulation system that generates particle information based on input from a client terminal. It also generates geometric solid information and determines the optimal GPUs for processing based on the number of particles and idle GPUs. The system stimulates particle flow by computing forces applied to each particle due to collisions, resulting in improved computational efficiency.

Career Highlights

Ji Qi is affiliated with the Chinese Academy of Sciences, where he continues to advance research in particle simulation technologies. His work has been instrumental in implementing virtual experimental simulations of high-density particles.

Collaborations

Ji Qi collaborates with esteemed colleagues, including Lei Yang and Yuan Tian, who contribute to his research endeavors.

Conclusion

Ji Qi's innovative contributions to particle flow simulation technology exemplify the impact of research and development in computational sciences. His work not only enhances efficiency but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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