Busan, South Korea

Ji Eun Yun

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Samsung Electronics Ltd., Wonik Materials. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji Eun Yun. Retrieved from https://idiyas.com/inventor/ji-eun-yun-2swwa4sz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ji Eun Yun: Semiconductor Materials Inventor.

Introduction

Ji Eun Yun is an inventor based in Busan, South Korea. His work concerns semiconductor materials and methods for producing compounds used in semiconductor-device fabrication. He is associated with Samsung Electronics Ltd. and Wonik Materials.

Latest Patents

The provided information lists one patent for Yun: “Method for Fabricating Trihalodisilane and Method for Fabricating Semiconductor Device Using the Same.” The invention describes reducing a halodisilane containing at least four halogen atoms with a mixed reducing agent, then obtaining a product that includes 1,1,1-trihalodisilane. The method also relates to fabricating a semiconductor device using the resulting material. Yun’s listed patent count is 1 patent.

Career Highlights

Yun’s patent work focuses on chemical processes relevant to semiconductor manufacturing. His listed company affiliations are Samsung Electronics Ltd. and Wonik Materials.

Collaborations

The provided information names Byung Keun Hwang and Min Soo Kang as Yun’s coworkers.

Conclusion

Ji Eun Yun’s listed invention addresses the production of trihalodisilane for semiconductor applications, reflecting his connection to materials and device fabrication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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