Daejeon, South Korea

Ji Eun Yoo

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Sk Innovation Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji Eun Yoo. Retrieved from https://idiyas.com/inventor/ji-eun-yoo-b26j4qjt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ji Eun Yoo - Innovator in Multilayer Film Technology

Introduction

Ji Eun Yoo is a prominent inventor based in Daejeon, South Korea. She has made significant contributions to the field of materials science, particularly in the development of multilayer films. Her innovative work has led to the creation of a unique film that combines aliphatic polycarbonate and polylactic acid-based polymers.

Latest Patents

Ji Eun Yoo holds 1 patent for her invention titled "Multilayer Film." This invention relates to a multilayer film coextruded from an aliphatic polycarbonate and polylactic acid-based polymer. The method she developed allows for the production of a multilayer film with excellent adhesive properties, eliminating the need for a separate adhesive layer.

Career Highlights

Ji Eun Yoo is currently employed at SK Innovation Co., Ltd., a leading company in the energy and materials sector. Her role at the company has allowed her to further her research and development efforts in innovative materials.

Collaborations

Some of her notable coworkers include Min Ho Jeon and Moon Jung Choi, who contribute to the collaborative environment at SK Innovation Co., Ltd. Their teamwork fosters innovation and drives the development of new technologies.

Conclusion

Ji Eun Yoo's work in multilayer film technology exemplifies the impact of innovative thinking in materials science. Her contributions continue to advance the field and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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