Seoul, South Korea

Ji-eun Park

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ewha University-Industry Collaboration Foundation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji-eun Park. Retrieved from https://idiyas.com/inventor/ji-eun-park-6y6jjlw2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Ji-eun Park: Innovator in Responsive Polymer Technology

Introduction

Ji-eun Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of responsive polymer technology. His innovative work focuses on developing materials that can react to environmental stimuli.

Latest Patents

Ji-eun Park holds a patent for a "Sensitive conjugated polymer structure color and sensor using same." This patent describes a responsive polymer film, a method of preparing the responsive polymer film, and a sensor utilizing this advanced polymer technology. His work in this area showcases the potential applications of responsive materials in various industries.

Career Highlights

Ji-eun Park is affiliated with the Ewha University-Industry Collaboration Foundation. His role at this institution allows him to engage in cutting-edge research and development. He has demonstrated a commitment to advancing the field of polymer science through his innovative approaches.

Collaborations

Ji-eun Park has collaborated with talented individuals such as So-Jung Park and Jerome Kartham Hyun. These partnerships enhance the research and development efforts in responsive polymer technology.

Conclusion

Ji-eun Park's contributions to responsive polymer technology highlight his innovative spirit and dedication to advancing scientific knowledge. His work continues to inspire future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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