Yongin, South Korea

Jeung-Woo Huh

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeung-Woo Huh. Retrieved from https://idiyas.com/inventor/jeung-woo-huh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Jeung-Woo Huh: Innovator in Mask Frame Assembly Technology

Introduction

Jeung-Woo Huh is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of thin film deposition technology. His innovative work has led to the development of a unique mask frame assembly that enhances manufacturing processes.

Latest Patents

Jeung-Woo Huh holds a patent for a "Mask frame assembly for thin film deposition and the manufacturing method thereof." This invention features a mask frame assembly that utilizes a plurality of stick-shaped split masks. Each split mask includes a deposition pattern corresponding to a unit screen. The design allows for the easy manufacturing of split masks that accommodate patterns for large screens, minimizing etching errors.

Career Highlights

Huh is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of display technology. His work has been instrumental in advancing the efficiency and accuracy of thin film deposition processes.

Collaborations

Jeung-Woo Huh has collaborated with talented colleagues, including Eui-Shin Shin and Jae-Seok Park. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Jeung-Woo Huh's innovative contributions to mask frame assembly technology exemplify the impact of dedicated inventors in the field of display technology. His work continues to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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