Tamil Nadu, India

Jesu Titus Irudayaraj

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jesu Titus Irudayaraj. Retrieved from https://idiyas.com/inventor/jesu-titus-irudayaraj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jesu Titus Irudayaraj: Innovator in Plasma Technology

Introduction

Jesu Titus Irudayaraj is a notable inventor based in Tamilnadu, India. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and solutions. His work is recognized for its impact on various industrial applications.

Latest Patents

Irudayaraj holds a patent for a "Shield for Plasma Chambers." This invention addresses critical challenges in plasma processing, enhancing the efficiency and safety of operations within plasma chambers. His patent is a testament to his ingenuity and technical expertise.

Career Highlights

Currently, Jesu Titus Irudayaraj is employed at Lam Research Corporation, a leading company in the semiconductor industry. His role involves developing advanced technologies that support the manufacturing of integrated circuits. His contributions have been instrumental in driving innovation within the company.

Collaborations

Irudayaraj has collaborated with talented professionals such as Yogesh Mahesh Sovani and Ravikumar Patil. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Jesu Titus Irudayaraj exemplifies the spirit of innovation in the field of plasma technology. His patent and work at Lam Research Corporation highlight his commitment to advancing technology and improving industrial processes. His contributions will undoubtedly continue to influence the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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