Jerry Vhi-Yi Guo

Title: The Innovative Contributions of Jerry Vhi-Yi Guo

Introduction

Jerry Vhi-Yi Guo is a notable inventor based in New Providence, NJ (US). He has made significant contributions to the field of semiconductor processing through his innovative patent. His work is particularly relevant in the context of advancing technologies that require precision and accuracy.

Latest Patents

Jerry Vhi-Yi Guo holds a patent for a "Process for making an x-ray mask." This method is designed to expose photoresist on a layer that is to be etched to a nominal dimension. The patent addresses challenges such as global divergence, local divergence, and dose non-uniformity by adjusting the feature dimension in the mask. The compensation is achieved by varying the dose provided by an electron beam, which is used to define the features on the x-ray mask. The features are typically encountered in the processing of semiconductor wafers, where the smallest dimension is 250 nm or less. He has 1 patent to his name.

Career Highlights

Jerry Vhi-Yi Guo is associated with Lucent Technologies Inc., where he has contributed to various projects that enhance semiconductor manufacturing processes. His expertise in x-ray mask technology has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Jerry has worked alongside notable colleagues such as Joseph Anthony Abate and George K Celler. Their collaborative efforts have furthered advancements in semiconductor technology.

Conclusion

Jerry Vhi-Yi Guo's innovative work in the development of x-ray mask processes exemplifies the critical role inventors play in advancing technology. His contributions continue to influence the semiconductor industry and pave the way for future innovations.