Jerry C Shaw is a notable inventor based in Ridgefield, CT (US). He has made significant contributions to the field of photolithography, holding a total of 3 patents. His work focuses on methods that enhance the precision and efficiency of lithographic processes.

Latest Patents

One of Shaw's latest patents is a method for controlling a line dimension arising in photolithographic processes. This method involves measuring signals at multiple times and angles to extract contributions from patterns evolving in photoresist. Another significant patent is related to latent-image control of lithography tools. This invention provides a measurement apparatus and procedure for aligning verification marks on substrates, ensuring accuracy in the production of electronic devices.

Career Highlights

Jerry C Shaw is associated with the International Business Machines Corporation (IBM), where he applies his expertise in photolithography. His innovative approaches have contributed to advancements in the manufacturing of electronic components.

Collaborations

Shaw has collaborated with notable coworkers, including Robert R Jackson and Theodore Gerard Van Kessel. Their combined efforts have furthered research and development in the field of lithography.

Conclusion

Jerry C Shaw's contributions to photolithography demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of the complexities involved in lithographic processes, making him a valuable asset in the field.

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