Best, Netherlands

Jeroen Landsbergen

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ihi Hauzer Techno Coating B.v.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeroen Landsbergen. Retrieved from https://idiyas.com/inventor/jeroen-landsbergen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jeroen Landsbergen: Innovator in Decorative Layer Technology

Introduction

Jeroen Landsbergen is a notable inventor based in Best, Netherlands. He has made significant contributions to the field of material science, particularly in the development of innovative decorative layers for various applications.

Latest Patents

Landsbergen holds a patent for an article that features a relatively soft support material combined with a relatively hard decorative layer. The invention also includes a method for its manufacture. This object is characterized by an intermediate layer that contains diamond-like carbon (DLC) as its main component, enhancing the durability and aesthetic appeal of the product.

Career Highlights

Jeroen is associated with Ihi Hauzer Techno Coating B.V., where he applies his expertise in material technology. His work focuses on creating advanced coatings that improve the performance and longevity of various products.

Collaborations

Throughout his career, Landsbergen has collaborated with talented professionals such as Michiel Eerden and Paul Peeters. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Jeroen Landsbergen is a distinguished inventor whose work in decorative layer technology has paved the way for advancements in material science. His innovative approach continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…