Pittsford, NY, United States of America

Jeremy Zuch

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jeremy Zuch

Introduction

Jeremy Zuch is an accomplished inventor based in Pittsford, NY (US). He has made significant contributions to the field of RF impedance matching, particularly in optimizing performance for plasma chambers. His innovative approach has led to the development of a unique patent that addresses critical challenges in this area.

Latest Patents

Jeremy Zuch holds a patent titled "Fleetwide impedance tuning performance optimization." This patent encompasses a method for field adjusting calibrating factors of multiple RF impedance matches for controlling various plasma chambers. The method involves collecting and storing operational data from these RF impedance matches and determining a tune space for each match based on the collected data. Additionally, it includes adjustments to account for variability in the RF impedance matches and tuning elements to manage time-varying and process-related load impedances. The patent also outlines obtaining operating windows for these variable tuning elements.

Career Highlights

Jeremy Zuch is currently employed at Applied Materials, Inc., where he continues to innovate and develop solutions in the field of plasma technology. His work has been instrumental in enhancing the efficiency and effectiveness of RF impedance matching systems.

Collaborations

One of his notable coworkers is Nathan Ransom, with whom he collaborates on various projects within the company. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Jeremy Zuch's contributions to RF impedance matching and plasma technology exemplify the spirit of innovation. His patent reflects a deep understanding of the complexities involved in optimizing performance across multiple systems. Through his work at Applied Materials, Inc., he continues to push the boundaries of technology and improve industry standards.

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