Company Filing History:
Years Active: 2020
Title: The Innovations of Jeremy (Shi-Ming) Wei
Introduction
Jeremy (Shi-Ming) Wei is a notable inventor based in Shanghai, China. He has made significant contributions to the field of metrology through his innovative designs and methodologies. His work focuses on enhancing the accuracy of measurements in manufacturing processes.
Latest Patents
Jeremy Wei holds a patent for a "Verification Metrology Target and Their Design." This patent outlines methods for designing metrology targets and verification targets. The methods include utilizing Optical Critical Dimension (OCD) data related to designed metrology targets as an estimation of discrepancies between target models and actual targets on a wafer. Additionally, he proposes adjustments to metrology target design models to compensate for these discrepancies. The verification targets may include overlay target features and are optimized in size to be measurable by an OCD sensor. This innovation enables compensation for inaccuracies resulting from production process variations.
Career Highlights
Jeremy Wei is currently employed at Kla Tencor Corporation, where he applies his expertise in metrology and design. His work has contributed to advancements in the accuracy of metrology measurements, which are crucial for the semiconductor manufacturing industry.
Collaborations
Some of his notable coworkers include Michael E Adel and Inna Tarshish-Shapir. Their collaboration has likely fostered an environment of innovation and shared expertise within the company.
Conclusion
Jeremy (Shi-Ming) Wei's contributions to metrology through his patent and work at Kla Tencor Corporation highlight his role as an influential inventor in the field. His innovative approaches are paving the way for more accurate manufacturing processes.