Shanghai, China

Jeremy Shi

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations by Jeremy Shi: Pioneering Ice Slip Resistance Technology

Introduction

Jeremy Shi is an innovative inventor based in Shanghai, China. He has made significant contributions to the field of traction surfaces, particularly with his unique approach to ice slip resistance. His work is crucial for enhancing safety in icy conditions, making him a notable figure in the realm of inventions.

Latest Patents

Jeremy Shi holds a patent for an "Ice slip resistance formula and process." This invention relates to a traction surface and methods for forming it. The traction surface comprises a compound material that includes glass fibers oriented orthogonal to the surface. When this traction surface contacts an icy surface, the glass fibers penetrate the liquid-like top layer of the ice, providing grip with the ice layer beneath. This innovative method involves integrating glass fibers into the compound material, orienting them appropriately, and forming the split compound material into a functional traction surface.

Career Highlights

Jeremy Shi is currently employed at Honeywell International Inc., where he continues to develop and refine his inventions. His work at Honeywell allows him to collaborate with other talented professionals in the field, further enhancing his contributions to innovation.

Collaborations

Some of Jeremy's coworkers include Steve Jun Chen and Jex Zhang. Their collaboration fosters a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jeremy Shi's innovative approach to ice slip resistance technology exemplifies the importance of invention in enhancing safety and functionality. His contributions are paving the way for advancements in traction surfaces, making a significant impact in various applications.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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