This inventor holds 1 USPTO granted patent. Top assignee: Genus, Inc.. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Jereld Winkler: Innovator in Atomic Layer Deposition
Introduction
Jereld Winkler is a notable inventor based in Union City, CA (US). He has made significant contributions to the field of material science, particularly in the area of atomic layer deposition and chemical vapor deposition. His innovative approach has led to advancements that enhance the uniformity and repeatability of these processes.
Latest Patents
Jereld Winkler holds a patent for a "Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition." This method involves depositing a passivating layer of a first material on the interior reactor surface of a cold or warm wall reactor. The first material is non-reactive with one or more precursors used to form a second material. By applying this passivation layer, the uniformity and repeatability of film layer deposition on a substrate are significantly improved, especially when using precursors with low vapor pressure.
Career Highlights
Jereld Winkler is currently employed at Genus, Inc., where he continues to push the boundaries of innovation in his field. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of deposition processes.
Collaborations
Throughout his career, Jereld has collaborated with esteemed colleagues, including Ana R Londergan and Sasangan Ramanathan. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Jereld Winkler's contributions to atomic layer deposition and chemical vapor deposition exemplify the spirit of innovation. His patented methods are paving the way for improved processes in material science, showcasing the importance of inventors in advancing technology.