Company Filing History:
Years Active: 1986-1990
Title: The Innovative Contributions of Jer-Ming Yang
Introduction
Jer-Ming Yang is an accomplished inventor based in Yorktown Heights, NY, who has made significant contributions to the field of photoresist technology. With three patents to his name, Yang has been influential in advancing processes that are vital to various applications in the semiconductor industry.
Latest Patents
Jer-Ming Yang's latest patents include notable innovations such as a "Photoresist compositions of controlled dissolution rate in alkaline." This invention discloses a photoresist mixture comprising a photoactive compound and an alkali-soluble resin binder, which includes an unsaturated dicarboxylic acid esterified polymeric material. This advancement holds promise for enhancing the performance and reliability of photoresists in electronic manufacturing.
Another significant patent from Yang is titled "Top imaged resists," which focuses on methods to convert a single resist layer into a multilayered resist. This innovation involves converting the upper portion of a resist layer into a dry-etch resistant form, whether through blanket or patterned conversion techniques. The ability to alter the composition and absorptivity of the resist material allows for precision in developing patterns essential for various applications.
Career Highlights
Jer-Ming Yang currently works at the International Business Machines Corporation (IBM), an esteemed entity in the realm of technology and innovation. His work at IBM has provided him with a platform to develop cutting-edge solutions in the semiconductor sector. Yang's expertise in photoresist technology has fortified the company's goal of advancing electronic components and systems.
Collaborations
Throughout his career, Yang has collaborated with notable colleagues, including Kaolin N Chiong and Bea-Jane L Yang. These partnerships have facilitated the exchange of ideas and fostered the development of groundbreaking technologies, furthering advancements in the field.
Conclusion
In conclusion, Jer-Ming Yang stands out as a notable inventor whose contributions to photoresist technology have had a considerable impact on the industry. With a focus on innovative solutions and collaborations at IBM, Yang continues to contribute valuable advancements that pave the way for future technologies in semiconductor manufacturing.