Company Filing History:
Years Active: 1988
Title: The Innovative Contributions of Jer-Mind Yang
Introduction: Jer-Mind Yang is a notable inventor based in Yorktown Heights, NY. He has made significant contributions to the field of materials science, particularly in the development of patterned resist materials. His work has implications for various applications in technology and manufacturing.
Latest Patents: Jer-Mind Yang holds a patent for a "Patterned resist and process." This invention involves a patterned image that includes a substrate with a patterned image of a first resist polymeric material and a second, different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups. Additionally, at least the surface layer of the delineated and uncovered first resist polymer material is reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of the polymeric material.
Career Highlights: Jer-Mind Yang is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to engage in cutting-edge research and development, contributing to the advancement of technology in various sectors.
Collaborations: Throughout his career, Jer-Mind Yang has collaborated with esteemed colleagues, including Burn J Lin and Bea-Jane L Yang. These collaborations have fostered innovation and have led to the successful development of new technologies.
Conclusion: Jer-Mind Yang's contributions to the field of materials science and his innovative patent demonstrate his commitment to advancing technology. His work at IBM and collaborations with other professionals highlight the importance of teamwork in driving innovation forward.