Seoul, South Korea

Jeongtaek Park

This inventor holds 18 USPTO granted patents and 4 published patent applications and 14 EPO patents. Top assignee: Lg Electronics Inc.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeongtaek Park. Retrieved from https://idiyas.com/inventor/jeongtaek-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 88.9

 

Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Changwon-si, KR (2018)
  • Seoul, KR (2016 - 2024)

Company Filing History:


Years Active: 2016-2026

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18 patents (USPTO):Explore Patents

Title: Jeongtaek Park: Innovator in Mask Technology

Introduction

Jeongtaek Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of mask technology, holding a total of 16 patents. His innovative designs focus on enhancing the functionality and comfort of mask apparatuses.

Latest Patents

Among his latest patents is a mask apparatus that features a mask body, a seal at the rear surface, and a fan module at the front. This design includes an air duct that guides external air to a breathing space, ensuring efficient airflow. Another notable patent describes a mask apparatus with a filter mounting portion and a filter cover, which enhances the mask's protective capabilities while maintaining user comfort.

Career Highlights

Jeongtaek Park is currently associated with LG Electronics Inc., where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the design and functionality of personal protective equipment.

Collaborations

He collaborates with talented coworkers, including Sanghyuk Son and Jieun Choi, contributing to a dynamic team focused on innovation.

Conclusion

Jeongtaek Park's contributions to mask technology exemplify his commitment to innovation and improvement in personal protective equipment. His patents reflect a deep understanding of user needs and technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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