This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jeongsu Lee: Innovator in Plasma Processing Technology
Introduction
Jeongsu Lee is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on developing advanced systems for substrate and wafer processing using plasma phase shift techniques.
Latest Patents
Jeongsu Lee's latest patents include a "Substrate Processing Apparatus Using Plasma Phase Shift" and a "Wafer Processing Apparatus Using Plasma Phase Shift." The substrate processing system is designed to comprise multiple reaction chambers on a platform, each configured to process substrates. It features a plasma generator that generates plasma or plasma power with specific frequencies and phases, providing this power to the reaction chambers. Additionally, a control circuit is integrated to adjust the phase of the plasma independently for each chamber. Similarly, the wafer processing system employs a comparable design, focusing on the processing of wafers with the same advanced plasma technology.
Career Highlights
Jeongsu Lee is currently associated with Asm IP Holding B.V., where he continues to innovate in the field of plasma processing. His expertise in this area has positioned him as a key player in the development of cutting-edge technologies that enhance substrate and wafer processing efficiency.
Collaborations
Jeongsu has collaborated with notable coworkers, including Dongok Shin and Songwhe Herr, contributing to the advancement of their shared projects and innovations.
Conclusion
Jeongsu Lee's contributions to plasma processing technology through his patents and work at Asm IP Holding B.V. highlight his role as a significant inventor in this field. His innovative approaches continue to shape the future of substrate and wafer processing systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile