Suwon, South Korea

Jeonghun Kang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeonghun Kang. Retrieved from https://idiyas.com/inventor/jeonghun-kang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jeonghun Kang: Innovator in Substrate Processing Technology

Introduction

Jeonghun Kang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a patented apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jeonghun Kang holds a patent for a "Substrate processing apparatus and a method of processing a substrate using the same." This apparatus includes an outer bath, an inner bath, a chemical solution supply pipe, and an outer gas supply pipe. The design allows for effective processing of substrates, making it a valuable asset in various industrial applications.

Career Highlights

Kang is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to collaborate with some of the brightest minds in the industry, further enhancing his expertise and contributions.

Collaborations

Some of his notable coworkers include Junghyun Song and Ansook Sul. Their collaborative efforts have contributed to advancements in substrate processing technologies.

Conclusion

Jeonghun Kang's innovative spirit and dedication to his work have made him a key figure in substrate processing technology. His patent reflects his commitment to improving industrial processes, and his contributions will likely influence the field for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…