This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Jeong Woo Han: Innovator in Substrate Treatment Technology
Introduction
Jeong Woo Han is a notable inventor based in Gunpo-si, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique support unit that enhances the efficiency of substrate processing.
Latest Patents
Jeong Woo Han holds a patent for a "Support unit and substrate treating apparatus." This invention provides a support unit that includes a support plate designed to hold a substrate. The support plate features an electrostatic electrode that generates electrostatic force to stabilize the substrate. Additionally, it incorporates a heater to heat the substrate, an insulating plate to prevent heat loss, and a bimetal member that compensates for bending due to thermal expansion. This innovative design allows for precise control over the substrate's positioning and treatment.
Career Highlights
Jeong Woo Han is currently employed at Semes Co., Ltd., where he continues to develop cutting-edge technologies in substrate treatment. His work has been instrumental in advancing the capabilities of substrate processing equipment. With a focus on innovation, he has contributed to the company's reputation as a leader in the industry.
Collaborations
Jeong Woo Han collaborates with talented colleagues, including Kyung Man Kim and Ji-hwan Lee. Together, they work on various projects that aim to push the boundaries of substrate treatment technology.
Conclusion
Jeong Woo Han's contributions to substrate treatment technology exemplify his commitment to innovation and excellence. His patent and ongoing work at Semes Co., Ltd. highlight his role as a key player in the field. His efforts continue to shape the future of substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
