Jeong-Lyeol Park

Title: Jeong-Lyeol Park: Innovator in Image Sensor Technology

Introduction

Jeong-Lyeol Park is a notable inventor based in Chungcheongbuk-do, South Korea. He has made significant contributions to the field of image sensor technology, holding a total of 2 patents. His innovative approaches have paved the way for advancements in the fabrication of image sensors.

Latest Patents

Jeong-Lyeol Park's latest patents include a method for fabricating an image sensor that involves forming an insulation layer over a substrate in both a logic circuit region and a pixel region. The process includes forming a photoresist over the insulation layer and patterning it to expose the insulation layer in the pixel region while keeping it covered in the logic circuit region. The thickness of the photoresist pattern is gradually decreased in the interfacial region between these two areas. An etch back process is then performed under conditions where the etch rate of the photoresist pattern is substantially the same as that of the insulation layer. Another patent focuses on a photo mask and method for fabricating an image sensor using similar techniques.

Career Highlights

Throughout his career, Jeong-Lyeol Park has worked with various companies, including Crosstek Capital, LLC and Intellectual Ventures II LLC. His experience in these organizations has contributed to his expertise in the field of image sensors and related technologies.

Collaborations

Jeong-Lyeol Park has collaborated with notable professionals in his field, including his coworker Hyun-Hee Nam. These collaborations have further enhanced his innovative capabilities and contributions to technology.

Conclusion

Jeong-Lyeol Park is a distinguished inventor whose work in image sensor technology has led to significant advancements in the industry. His patents reflect his commitment to innovation and excellence in the field.