Jeong Ju Park

Title: Jeong Ju Park: Innovator in Pattern Fabrication Technologies

Introduction

Jeong Ju Park is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of pattern fabrication, holding a total of four patents. His work primarily focuses on methods that enhance the precision and efficiency of pattern formation in various applications.

Latest Patents

Among his latest patents, one notable invention is a method of fabricating pattern structures. This method involves forming mask patterns that are spaced apart on an etch target layer. It includes filling openings with a block copolymer material and annealing it to create distinct patterns. The first patterns consist of first polymer blocks, while the second patterns are made up of second polymer blocks. Another significant patent is related to methods of forming fine patterns. This method encompasses forming a mask on an etching target and creating an anti-reflective layer. The process also involves forming fixing patterns and phase-separating a block copolymer layer to achieve the desired patterning.

Career Highlights

Jeong Ju Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of semiconductor technologies. His expertise in pattern fabrication has positioned him as a key player in advancing the capabilities of modern electronics.

Collaborations

He has collaborated with notable coworkers, including Eunsung Kim and Shiyong Yi, contributing to various projects that push the boundaries of technology in their field.

Conclusion

Jeong Ju Park's work in pattern fabrication technologies exemplifies the innovative spirit of modern inventors. His patents reflect a commitment to advancing the field and improving manufacturing processes.