Gyeonggi-do, South Korea

Jeong Hyup Yu

This inventor holds 1 USPTO granted patent and 10 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeong Hyup Yu. Retrieved from https://idiyas.com/inventor/jeong-hyup-yu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Jeong Hyup Yu

Introduction

Jeong Hyup Yu is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jeong Hyup Yu holds a patent for a "Substrate treating apparatus and substrate treating method." This invention includes a processing vessel with a dedicated processing space, a support unit for substrate rotation, a liquid supply unit for processing liquid, and a heating unit for substrate heating. The support unit features a spin chuck, a driver for rotation, a chuck pin for substrate contact, and a chuck pin moving unit that adjusts the pin's position between contact and open states.

Career Highlights

Yu's career is marked by his work at Semes Co., Ltd., where he has been instrumental in advancing substrate treatment technologies. His innovative designs and methods have positioned him as a key figure in his field. His patent reflects his commitment to improving processing techniques and enhancing product quality.

Collaborations

Jeong Hyup Yu has collaborated with talented coworkers, including Won Sik Son and Se Hoon Oh. Their combined expertise has contributed to the successful development of innovative technologies in substrate treatment.

Conclusion

Jeong Hyup Yu's contributions to substrate treatment technology exemplify his dedication to innovation. His patent showcases his ability to create effective solutions in the industry. His work continues to influence advancements in substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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