Jens Meyer

Title: Jens Meyer: Innovator in Polymer Dispersion Technology

Introduction

Jens Meyer is a notable inventor based in Cologne, Germany. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to polymer dispersion.

Latest Patents

Jens Meyer holds a patent for a "Patterned deposition mask formed using polymer dispersed in a liquid solvent." This invention involves forming a polymer dispersion layer on a substrate or semiconductor light-emitting devices. After the polymer dispersion layer is created, it undergoes drying and curing to form a cured polymer layer. The cured polymer layer is selectively applied to masked areas of the substrate, allowing for the formation of a material layer on the exposed areas. Once the material layer is established, the cured polymer layer is removed from the masked areas, leaving the material layer intact on the exposed regions.

Career Highlights

Jens Meyer is currently employed at Lumileds Singapore Pte. Ltd., where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in enhancing the efficiency and effectiveness of light-emitting devices.

Collaborations

Jens collaborates with talented individuals such as Marinus Johannes Petrus Maria Van Gerwen and Ronja Missong, contributing to a dynamic and innovative work environment.

Conclusion

Jens Meyer is a distinguished inventor whose work in polymer dispersion technology has the potential to impact the semiconductor industry significantly. His innovative approach and collaborative spirit continue to drive advancements in this field.