Poughkeepsie, NY, United States of America

Jennifer C Clark

This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2013-2014.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Innovations by Jennifer C Clark

Introduction

Jennifer C Clark is a notable inventor based in Poughkeepsie, NY (US). She has made significant contributions to the field of semiconductor technology. With a total of 2 patents, her work focuses on improving the fabrication processes of semiconductor devices.

Latest Patents

Jennifer's latest patents include innovative methods for wafer backside defectivity clean-up. One of her patents describes a wafer and a fabrication method that includes a base structure with a substrate for fabricating semiconductor devices. This base structure has a front side where the semiconductor devices are formed and a back side opposite the front side. An integrated layer is formed in the back side of the base structure, which includes impurities that alter etch selectivity relative to the base structure. This allows the integrated layer to be selectively removable from the base structure, effectively removing defects incurred during the fabrication of semiconductor devices.

Career Highlights

Jennifer C Clark is currently employed at International Business Machines Corporation, commonly known as IBM. Her work at IBM has allowed her to explore and develop her innovative ideas in semiconductor technology.

Collaborations

Some of her notable coworkers include Emily R Kinser and Ian D Melville. Their collaboration has contributed to the advancement of technology within their field.

Conclusion

Jennifer C Clark's contributions to semiconductor technology through her patents and work at IBM highlight her role as an influential inventor. Her innovative approaches continue to shape the future of semiconductor fabrication.

Profile summary based on public USPTO records.
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