Company Filing History:
Years Active: 1992-2005
Title: **Jeng H Hwang: Innovator in Semiconductor Technology**
Introduction
Jeng H Hwang is a prominent inventor based in Cupertino, CA, who has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 24 patents, Hwang’s work focuses primarily on innovative techniques for patterning and improving the efficiency of electronic components.
Latest Patents
Among Hwang’s latest patents are two notable innovations:
1. **Masking methods and etching sequences for patterning electrodes of high density RAM capacitors** - This patent outlines a method of etching a noble metal electrode layer on a substrate, producing semiconductor devices with electrodes closely spaced, measuring equal to or less than 0.35 μm. The approach involves heating the substrate above 150°C and using a high-density inductively coupled plasma of various etchant gases.
2. **Method of preventing short circuits in magnetic film stacks** - This invention presents a method for preventing electrical short circuits within multi-layer magnetic film stacks. It involves depositing a protective layer on an exposed surface of a magnetic material to safeguard it from conductive residues during the etching process, making it valuable in developing magneto-resistive random access memory (MRAM) devices.
Career Highlights
Throughout his career, Jeng H Hwang has held key positions in leading companies, notably Applied Materials, Inc., where his expertise has significantly driven advancements in semiconductor fabrication technologies. His innovative designs and techniques have enhanced the efficiency and capabilities of memory storage devices.
Collaborations
Hwang has collaborated with noteworthy professionals in the industry, including Steve S Y Mak and Chentsau Chris Ying. These partnerships have contributed to the development of groundbreaking technologies that address contemporary challenges in the semiconductor sector.
Conclusion
Jeng H Hwang’s innovative spirit and technical prowess have positioned him as a leading figure in semiconductor innovation. With a substantial number of patents and a dedication to improving electronic device performance, Hwang continues to shape the future of technology. His work not only exemplifies creativity but also highlights the importance of collaboration in driving technological advancements.