Jen-Shiang Wang

Title: Innovations of Jen-Shiang Wang in Elastomer Spatial Light Modulators

Introduction

Jen-Shiang Wang is an accomplished inventor based in Stanford, CA. He has made significant contributions to the field of lithography through his innovative designs and fabrication processes. His work focuses on elastomer spatial light modulators, which have the potential to revolutionize extreme ultraviolet (EUV) lithography systems.

Latest Patents

Wang holds a patent for "Elastomer spatial light modulators for extreme ultraviolet lithography." This invention addresses several challenges in the field and enables the elastomer spatial light modulator (eSLM) to function as programmable masks for EUV lithography systems. The design includes a unique process where bottom electrodes are deposited and patterned on an insulation layer. A sacrificial layer is then applied, followed by the formation of a protective nitride shell. This shell prevents out-gassing and degradation of the elastomer during operations. The innovative design allows for the injection of elastomer into a cavity, creating a 2-D array of elastomer pillars, each equipped with a capacitive actuator. The multilayer mirror stack deposited on the surface achieves high reflectivity, exceeding 70% in EUV.

Career Highlights

Wang is affiliated with Leland Stanford Junior University, where he continues to advance research in the field of lithography. His work has garnered attention for its practical applications and innovative approach to solving existing challenges in the industry.

Collaborations

Wang has collaborated with notable colleagues, including Il Woong Jung and Olav Solgaard. These partnerships have further enhanced the impact of his research and innovations.

Conclusion

Jen-Shiang Wang's contributions to elastomer spatial light modulators represent a significant advancement in EUV lithography technology. His innovative designs and collaborative efforts continue to push the boundaries of what is possible in this field.