Jen-Po Lin

Title: The Innovations of Inventor Jen-Po Lin

Introduction

Jen-Po Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Jen-Po Lin holds a patent for "Semiconductor devices and methods for fabrication thereof." This patent describes a MIM capacitor that includes a straining layer on an electrode, along with a high-k dielectric layer formed on the straining layer. The innovative straining layer allows the high-k dielectric layer to achieve high crystallization without the need for an additional annealing process. This high crystallization enhances the dielectric value (k-value), thereby improving capacitance density in the MIM capacitor. Some embodiments of his invention include stacked MIM capacitors with symmetrically arranged high-k dielectric layers and straining layers.

Career Highlights

Jen-Po Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance semiconductor technologies. His expertise and innovative approach have positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Jen-Po Lin has collaborated with talented individuals such as Cherng-Yu Wang and Hsiao-Kuan Wei. These collaborations have further enriched his work and contributed to the development of cutting-edge semiconductor solutions.

Conclusion

Jen-Po Lin's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor devices, showcasing the impact of dedicated inventors in technology.