Taipei, Taiwan

Jen-Chieh Li

This inventor holds 1 USPTO granted patent. Top assignee: Ta Liang Technology Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jen-Chieh Li. Retrieved from https://idiyas.com/inventor/jen-chieh-li-cg94ntyz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Jen-Chieh Li

Introduction

Jen-Chieh Li is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of surface measurement technology. His innovative approach has led to advancements that enhance the efficiency of polishing processes.

Latest Patents

Jen-Chieh Li holds a patent for a "Method, system and apparatus for uniformed surface measurement." This invention provides a system and method for uniform surface measurement, utilizing a sensor to perform measurements on a carrier within a polishing machine. The measuring trajectory of the sensor is adjusted by controlling the pivoting of a sensor carrier and the rotation of a platform in the polishing machine. This innovation allows for real-time monitoring of the polishing state, thereby improving the overall efficiency of the polishing process.

Career Highlights

Li is currently associated with Ta Liang Technology Co., Ltd., where he continues to develop and refine his inventions. His work has been instrumental in advancing the technology used in polishing machines, making them more effective and reliable.

Collaborations

Some of his notable coworkers include Chao-Chang Chen and Yong-Jie Ciou, who have collaborated with him on various projects within the company.

Conclusion

Jen-Chieh Li's contributions to surface measurement technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving industrial processes, showcasing the importance of continuous innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…