Amsterdam, Netherlands

Jelle Sernee

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Feelgood Metals B.v.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jelle Sernee. Retrieved from https://idiyas.com/inventor/jelle-sernee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jelle Sernee: Innovator in Density-Based Separation Processes

Introduction

Jelle Sernee is a notable inventor based in Amsterdam, Netherlands. He has made significant contributions to the field of particle separation technology. His innovative approach focuses on enhancing the efficiency of separation processes.

Latest Patents

Jelle Sernee holds a patent for a "Separation process with separation media loss reduction." This invention is directed to a process for separating particles using a wet density-based separation device. The process involves coating at least part of the particles prior to their introduction into the density-based separation device. This method allows for the conservation of separation medium, which is crucial in density-based separation processes.

Career Highlights

Jelle Sernee is associated with Feelgood Metals B.V., where he applies his expertise in separation technologies. His work has contributed to advancements in the efficiency and sustainability of metal recovery processes.

Collaborations

He collaborates with colleagues such as Jaap Korneel Vandehoek and Jaap Van Den Hoek, who share his commitment to innovation in the field.

Conclusion

Jelle Sernee's contributions to the field of particle separation highlight his role as an innovator dedicated to improving industrial processes. His patent reflects a significant advancement in the efficiency of separation technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…