Company Filing History:

10 out of 1,214

Headway Technologies, Incorporated

where one patent can have more than one assignee

Years Active: 2004-2012

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8256096 - Method of using xenon ion beams to improve track width definition (2012-09-04),

2. 8087157 - Process to manufacture magnetic tunnel junction read head (2012-01-03),

3. 7864490 - CPP head with parasitic shunting reduction (2011-01-04),

4. 7810227 - Process to manufacture CPP GMR read head (2010-10-12),

5. 7420780 - Thin laminated single pole perpendicular write head (2008-09-02),

6. 7279269 - CPP head with parasitic shunting reduction (2007-10-09),

7. 7064924 - Thin laminated single pole perpendicular write head (2006-06-20),

8. 7016168 - Method of increasing CPP GMR in a spin valve structure (2006-03-21),

9. 6821717 - Process to form narrow write track for magnetic recording (2004-11-23),

10. 6759084 - Process to form NOL structure for CPP GMR (2004-07-06),

Title: Inventor Jeiwei Chang: Innovations in Ion Beam Technology

Introduction

Jeiwei Chang, a renowned inventor based in Cupertino, California, has made significant contributions to the field of ion beam technology. With a total of ten patents to his name, Chang's innovations focus primarily on enhancing manufacturing processes in the semiconductor industry.

Latest Patents

Two of his latest patents showcase his expertise and ingenuity:

1. **Method of Using Xenon Ion Beams to Improve Track Width Definition**: This method utilizes a beam of xenon ions along with a suitable mask to ion mill a stack until a thin layer, not exceeding 0.1 microns in thickness, is removed. This process results in the formation of a pedestal with sidewalls, including a vertical section and a shortened taper portion, followed by the application of conductive lead layers. The use of xenon as the sputtering gas allows for precise control over the milling termination point.

2. **Process to Manufacture Magnetic Tunnel Junction Read Head**: Similar to his technique for improving track width definition, this process involves ion milling a magnetic tunnel junction (MTJ) stack using a beam of xenon ions. A part of the MTJ stack is removed to create a pedestal with sidewalls comprising a vertical section that includes all of the free layer. The process continues with the formation of the longitudinal bias and conductive lead layers, with xenon facilitating enhanced control during milling.

Career Highlights

Throughout his career, Jeiwei Chang has worked with prominent companies in the technology sector, including Headway Technologies and TDK Corporation. His work at these organizations has enabled him to refine his techniques and contribute to groundbreaking advancements in semiconductor manufacturing.

Collaborations

Chang has collaborated with notable experts in the field, including Kochan Ju and Min Li. These partnerships have played a crucial role in the development of his patents and innovations, fostering a collaborative environment that drives technological progress.

Conclusion

Jeiwei Chang stands out as a pivotal figure in the realm of ion beam technology and semiconductor manufacturing. His inventive approaches and successful collaborations have led to significant advancements in the industry, reflecting his commitment to innovation and excellence. As he continues to develop his ideas and grow in his field, the impact of his work will undoubtedly resonate throughout the technology landscape.

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