The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2008

Filed:

May. 16, 2006
Applicants:

Kochan Ju, Monte Sereno, CA (US);

Lijie Guan, Milpitas, CA (US);

Jeiwei Chang, Cupertino, CA (US);

Min LI, Fremont, CA (US);

Ben HU, Los Altos, CA (US);

Inventors:

Kochan Ju, Monte Sereno, CA (US);

Lijie Guan, Milpitas, CA (US);

Jeiwei Chang, Cupertino, CA (US);

Min Li, Fremont, CA (US);

Ben Hu, Los Altos, CA (US);

Assignee:

Headay Technologies, Inc., Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
Abstract

Single write poles tend to large shape anisotropy which results in a very large remnant field when not actually writing. This has now been eliminated by giving the write pole the form of a three layer laminate in which two ferromagnetic layers are separated by a non-magnetic or antiferromagnetic coupling layer. Strong magnetostatic coupling between the outer layers causes their magnetization directions to automatically be antiparallel to one another, unless overcome by the more powerful write field, leaving the structure with a low net magnetic moment. The thickness of the middle layer must be carefully controlled.


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