Company Filing History:
Years Active: 1998
Title: The Innovative Contributions of Jeffrey Varner
Introduction
Jeffrey Varner is a notable inventor based in Pacifica, CA (US). He has made significant contributions to the field of electron beam pattern generation. His work focuses on improving the precision and efficiency of exposing patterns on substrates.
Latest Patents
Varner holds a patent for a "Method and apparatus for run-time correction of proximity effects in an electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method." This innovative system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. The system evaluates these pixel dose exposure levels for one or more proximity effects, calculating necessary corrections to the dose exposure level and/or pixel location. The apparatus includes both calculation and storage capabilities for intermediate and final results. As corrections are calculated, they are provided to an exposure dose modulator, which applies them to the pattern formation. This allows for real-time corrections of both long-range and short-range proximity effects, enhancing the accuracy of the exposure process.
Career Highlights
Varner's career is marked by his dedication to advancing technology in the field of electron beam lithography. His innovative approach has led to the development of systems that significantly improve the quality of pattern exposure on substrates. His work is essential for industries that rely on precise electron beam patterning.
Collaborations
Throughout his career, Varner has collaborated with esteemed colleagues, including Lee H Veneklasen and Robert Innes. These collaborations have further enriched his work and contributed to the advancement of technology in his field.
Conclusion
Jeffrey Varner's contributions to the field of electron beam pattern generation are noteworthy. His innovative patent addresses critical challenges in the industry, showcasing his expertise and commitment to technological advancement. His work continues to influence the development of more efficient and accurate pattern exposure systems.