Jeffrey Sauer

Title: The Innovative Contributions of Jeffrey Sauer

Introduction

Jeffrey Sauer is a notable inventor based in Danvers, MA (US). He has made significant contributions to the field of charged particle technology. His work focuses on systems that inspect, modify, or analyze samples using charged particles.

Latest Patents

Sauer holds a patent for a "System to inspect, modify or analyze a region of interest of a sample by charged particles." This innovative system inspects, modifies, or analyzes a sample region via charged particles. The system includes a detector device that produces a pixel image with horizontal and vertical pixel resolutions. A charged particle deflection device generates a scanning charged particle beam in a designated scanning region. The deflection device is equipped with horizontal and vertical deflection units controlled by a digital to analog converter (DAC) that has a digital resolution larger than the pixel resolutions. The operator control interface allows for the selection of assignments between image pixels and digital inputs of the DAC, producing deflection signals to guide the charged particle beam accurately. This technology ensures reliable imaging of samples, even during zooming or panning within the sample's accessible region.

Career Highlights

Jeffrey Sauer is currently employed at Carl Zeiss SMT GmbH, where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the advancement of charged particle systems.

Collaborations

Sauer has collaborated with notable colleagues, including John A. Notte and Mark D. DiManna, contributing to the success of various projects within his field.

Conclusion

Jeffrey Sauer's contributions to charged particle technology exemplify the impact of innovation in scientific research and development. His patent and ongoing work at Carl Zeiss SMT GmbH highlight his commitment to advancing imaging technologies.