Company Filing History:
Years Active: 2021
Title: Jeffrey John Kowalski: Innovator in Lithography Technology
Introduction
Jeffrey John Kowalski is a notable inventor based in Bethel, CT (US). He has made significant contributions to the field of lithography, particularly with his innovative designs and systems. His work has implications for various applications in the semiconductor industry.
Latest Patents
Kowalski holds a patent for a "High stability collimator assembly, lithographic apparatus, and method." This lithography system includes an illumination system designed to produce a beam of radiation. It features a support for a patterning device that imparts a pattern on the beam, a projection system that projects the patterned beam onto a substrate, and an alignment system that comprises an illuminator. The illuminator consists of an optical fiber, an optical fiber protector, an optical fiber support with a first support arm assembly, an optical system, and an optical system support with a second support arm assembly.
Career Highlights
Kowalski is currently employed at ASML Holdings N.V., a leading company in the lithography equipment sector. His work at ASML has allowed him to be at the forefront of technological advancements in lithography systems.
Collaborations
Throughout his career, Kowalski has collaborated with notable colleagues, including David Taub and Joseph Ashwin Franklin. These collaborations have contributed to the development of innovative solutions in the lithography field.
Conclusion
Jeffrey John Kowalski's contributions to lithography technology through his patent and work at ASML Holdings N.V. highlight his role as an influential inventor in the industry. His innovations continue to shape the future of lithography systems.