Ontario, NY, United States of America

Jeffrey D Barner

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 1996.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Innovations of Jeffrey D. Barner

Introduction

Jeffrey D. Barner is an accomplished inventor based in Ontario, NY (US). He is known for his significant contributions to the field of thermal inkjet technology. His innovative approach has led to the development of a unique patent that addresses critical issues in printbar design.

Latest Patents

Jeffrey D. Barner holds a patent for "Full width array read or write bars having low induced thermal stress." This invention involves full width read and/or write assemblies, such as a full width thermal inkjet printbar. The patent describes materials with both high and low thermal coefficients of expansion. A suitable adhesive is utilized to provide lateral give while firmly holding the respective components together. This design ensures dimensional stability and relieves shear stress caused by differential expansion or contraction of materials.

Career Highlights

Barner has made notable advancements during his career at Xerox Corporation. His work has focused on enhancing the performance and reliability of thermal inkjet printbars. The innovative solutions he has developed have contributed to the efficiency of printing technologies.

Collaborations

Throughout his career, Jeffrey D. Barner has collaborated with esteemed colleagues, including Mark Anthony Cellura and Donald J. Drake. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their field.

Conclusion

Jeffrey D. Barner's contributions to the field of thermal inkjet technology exemplify the spirit of innovation. His patent for low induced thermal stress in printbars showcases his commitment to improving printing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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