Company Filing History:
Years Active: 1998-2000
Title: Innovations by Jeffrey C. Sayre
Introduction
Jeffrey C. Sayre is an accomplished inventor based in Oakland, NJ (US). He has made significant contributions to the field of cleaning technologies, particularly in environments that require stringent cleanliness standards. With a total of four patents to his name, Sayre's work focuses on enhancing cleaning methods and devices for specialized industries.
Latest Patents
Among his latest innovations is a cleaning device and method designed for use in clean rooms, semiconductor fabrication plants, and pharmaceutical manufacturing facilities. This cleaning kit includes a stack of extremely clean wipers packaged with a container of cleaning fluid in a liquid-tight outer container. The kit is stored until just before use, at which point fluid is released from the inner container into the wipers. In one embodiment, the inner container is frangible and can be broken by applying hand pressure to the outer container. This allows the cleaning liquid to soak into the wipers, which can then be removed for use. The container can be resealed to protect the wipers after the package has been opened. This innovative device and method minimize the deterioration of the wiper material due to prolonged contact with the cleaning fluid and help maintain the effectiveness of substances such as biocides.
Career Highlights
Jeffrey C. Sayre is currently associated with The Texwipe Company LLC, where he continues to develop and refine cleaning technologies. His work has been instrumental in providing solutions that meet the high standards required in various manufacturing and laboratory environments.
Collaborations
Sayre has collaborated with notable colleagues, including William R. Paley and Steven J. Paley, contributing to advancements in cleaning technologies.
Conclusion
Jeffrey C. Sayre's innovative contributions to cleaning technologies have made a significant impact on industries that require high levels of cleanliness. His patents reflect a commitment to improving cleaning methods and devices, ensuring that they meet the rigorous demands of modern manufacturing and laboratory environments.