Jeffrey C Haines

Title: The Innovations of Jeffrey C Haines

Introduction

Jeffrey C Haines is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor fabrication, holding a total of 5 patents. His work focuses on advancing photolithography techniques, which are crucial for the manufacturing of integrated circuits.

Latest Patents

One of Haines' latest patents is titled "Photolithography using interdependent binary masks." This invention involves an interdependent binary photomask designed for use in photolithography operations during semiconductor fabrication. The method includes fabricating these photomasks and utilizing them effectively. The photomask consists of a first and a second binary reticle, each containing patterns that are interdependent, allowing for precise pattern transfer onto wafers with features in different focal planes.

Another significant patent is the "Method of forming an alignment mark on a wafer, and a wafer comprising same." This patent describes a method that includes providing a wafer with a bulk substrate, an insulating layer, and a semiconducting layer. The process involves forming an opening in the layers to expose the bulk substrate, creating an alignment mark within the exposed area, and layering material above the mark. This innovation enhances the accuracy of semiconductor manufacturing processes.

Career Highlights

Throughout his career, Jeffrey C Haines has worked with prominent companies, including Advanced Micro Devices Corporation. His experience in the semiconductor industry has allowed him to develop and refine his innovative techniques, contributing to advancements in technology.

Collaborations

Haines has collaborated with notable professionals in his field, including Frederick N Hause and Thomas M Brown. These collaborations have likely enriched his work and led to further innovations in semiconductor technology.

Conclusion

Jeffrey C Haines is a distinguished inventor whose contributions to photolithography and semiconductor fabrication have made a lasting impact on the industry. His innovative patents and collaborations reflect his commitment to advancing technology in this critical field.