Bertram, TX, United States of America

Jeffrey C Dunnihoo

USPTO Granted Patents = 9 

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2008-2024

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9 patents (USPTO):Explore Patents

Title: The Innovative Journey of Jeffrey C. Dunnihoo

Introduction

Jeffrey C. Dunnihoo, an accomplished inventor based in Bertram, Texas, has made significant contributions to the field of electrostatic discharge (ESD) technology. With a total of nine patents to his name, he has become a notable figure in the world of innovations that enhance system-level ESD robustness.

Latest Patents

Dunnihoo's latest patents include groundbreaking developments in ESD pulse generators. The "Field Collapse Pulser" patent reveals exemplary embodiments that provide improved system-level ESD robustness characterization and qualification analysis. Such advancements are critical for ensuring the reliability and stability of electronic systems, and his contributions are paving the way for safer technological environments.

Career Highlights

Throughout his career, Jeffrey has held significant roles at reputable companies such as Pragma Design, Inc. and California Micro Devices Corporation. His work within these organizations has allowed him to focus on and refine his expertise in ESD technology, contributing to the development of innovative solutions in the realm of electronics.

Collaborations

Collaboratively, Dunnihoo has worked alongside talented individuals, including Chadwick N. Marak and Adam J. Whitworth. These partnerships have facilitated the exchange of ideas and propelled innovation forward, enabling the development of advanced technologies that address the challenges faced in electronic device design.

Conclusion

Jeffrey C. Dunnihoo stands as a testament to innovation in the field of electrostatic discharge technologies. His numerous patents not only highlight his inventive prowess but also reflect his commitment to enhancing the reliability of electronic systems. As he continues to pursue new inventions, the technological landscape will undoubtedly benefit from his work.

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