This inventor holds 1 USPTO granted patent. Top assignee: Etec Systems, Inc.. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Jeffery K Varner: Innovator in Electron Beam Lithography
Introduction
Jeffery K Varner is a notable inventor based in Pacifica, California. He has made significant contributions to the field of electron beam lithography, particularly with his innovative patent that enhances the precision of charged particle beam exposure strategies.
Latest Patents
Varner holds a patent for a "Raster shaped beam, electron beam exposure strategy using a two-dimensional multipixel flash field." This invention involves an electron beam column designed for lithography, which exposes surfaces to variable shapes through a raster scan. The system includes various components such as an electron source, transfer lens, and multiple apertures that work together to shape the beam and ensure accurate exposure of target areas.
Career Highlights
Jeffery K Varner is currently employed at Etec Systems, Inc., where he continues to develop and refine technologies related to electron beam lithography. His work has been instrumental in advancing the capabilities of lithographic processes, making them more efficient and precise.
Collaborations
Throughout his career, Varner has collaborated with esteemed colleagues such as Stephen A Rishton and Allan L Sagle. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.
Conclusion
Jeffery K Varner's contributions to electron beam lithography exemplify the impact of innovative thinking in technology. His patent and ongoing work at Etec Systems, Inc. highlight his commitment to advancing the field and improving lithographic techniques.