Brookfield, CT, United States of America

Jeff Roeder


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 74(Granted Patents)


Company Filing History:


Years Active: 2000

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2 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Jeff Roeder from Brookfield, CT

Introduction

Jeff Roeder, an innovative inventor based in Brookfield, Connecticut, has made significant contributions in the field of ferroelectric thin films. With a total of two patents to his name, Roeder's work focuses on methods that enhance the efficiency and effectiveness of thin film deposition techniques.

Latest Patents

Roeder's latest patents include a pioneering approach titled "Method for the selective deposition of bismuth based ferroelectric thin films." This inventive method describes a selective chemical vapor deposition process on a substrate that allows for high efficiency in bismuth deposition in certain areas while maintaining low deposition efficiency in others. This selectivity is achieved through careful combinations of substrate-precursor selections and specific process parameters.

His second patent, "Method for nucleation controlled chemical vapor deposition of metal," outlines a novel processing sequence for achieving a higher density of bismuth nucleation sites. This is accomplished by utilizing a substrate member with a controllably rough surface, along with various techniques such as reactive ion etching and chemical mechanical polishing. These methods enable the production of high-quality SBT films, which are vital for capacitors and memory devices.

Career Highlights

Throughout his career, Roeder has been associated with prominent companies in the technology sector. He has worked with Advanced Technology Materials, Inc. and Infineon Technologies LLC, contributing his expertise in advanced materials and manufacturing processes. His role in these organizations has allowed him to influence the development and optimization of ferroelectric materials.

Collaborations

In his journey as an inventor, Roeder has collaborated with notable coworkers such as Frank S. Hintermaier and Bryan Clark Hendrix. These partnerships have likely fostered a robust environment for innovation and have played a role in the successful realization of his patents.

Conclusion

Jeff Roeder exemplifies the spirit of innovation within the field of materials science. His contributions through his patents on ferroelectric thin film deposition techniques signify his importance as an inventor. As technology continues to evolve, Roeder's work remains relevant and impactful, shaping advancements in devices that utilize these technologies.

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