Daejeon, South Korea

Jeehong Lee

This inventor holds 1 USPTO granted patent. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeehong Lee. Retrieved from https://idiyas.com/inventor/jeehong-lee-2ovux8ml

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovator Jeehong Lee and His Contributions to Distortion Measurement

Introduction

Jeehong Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of distortion measurement through his innovative methods. His work is particularly relevant in applications that require precise motion estimation.

Latest Patents

Jeehong Lee holds a patent for a "Distortion Measuring Method." This method provides a systematic approach to measuring distortion in a current block. The process involves calculating the sum of distortion values of both high-frequency and low-frequency components of the current block. Specifically, it includes calculating the sum of distortion values of the high-frequency component, determining first and second distortion values of the low-frequency component, and combining these values to achieve an accurate measurement.

Career Highlights

Jeehong Lee is affiliated with the Korea Advanced Institute of Science and Technology, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications in various technological fields.

Collaborations

Jeehong Lee collaborates with fellow researcher HyunWook Park, contributing to the advancement of their shared projects and enhancing the quality of their research outcomes.

Conclusion

Jeehong Lee's innovative approach to distortion measurement exemplifies the impact of dedicated research in technology. His contributions are paving the way for advancements in motion estimation techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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