Jeb H Rankin

Title: **Jeb H. Rankin: Innovator in Lithographic Systems**

Introduction

Jeb H. Rankin is a notable inventor based in Richmond, Vermont, who has made significant contributions to the field of lithography. With a strong background in engineering and technology, Rankin is recognized for his innovative approach to mask fabrication methods.

Latest Patents

Jeb H. Rankin holds one patent titled "Multiple Lithographic System Mask Shape Sleeving." This invention encompasses a sophisticated mask fabrication method that involves several steps: receiving a mask design, sending first exposure parameters to a first exposure machine, sending second exposure parameters to a second exposure machine, and issuing exposure generation commands to both machines based on their respective parameters. This technological advancement plays a crucial role in enhancing the efficiency and precision of lithographic processes.

Career Highlights

Currently, Jeb H. Rankin is employed at International Business Machines Corporation (IBM), a company renowned for its innovation and leadership in the technology sector. His role at IBM has allowed him to work on cutting-edge projects that push the boundaries of lithographic techniques and semiconductor manufacturing.

Collaborations

Throughout his career, Rankin has collaborated with talented coworkers, including Brent A. Anderson and Adam Charles Smith. These partnerships have fostered an environment of creativity and innovation, contributing to the development of new technologies in the industry.

Conclusion

Jeb H. Rankin’s contributions to lithography through his patented invention demonstrate his commitment to advancing technology and improving manufacturing processes. As a dedicated inventor at IBM, his work continues to influence the field and pave the way for future innovations in lithographic systems.