This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Centre National De La Recherche Scientifique, Univ Paris Xiii Paris-Nord Villetaneuse. Active years: 2019.
Company Filing History:
1 out of 5,383 
1 out of 11 Years Active: 2019
Title: Jeanne Solard: Innovator in Photolithography
Introduction
Jeanne Solard is a notable inventor based in Deuil la Barre, France. She has made significant contributions to the field of photolithography, particularly in the development of methods for creating micro- or nano-scale patterned layers of material. Her innovative approach has implications for various applications in technology and materials science.
Latest Patents
Jeanne Solard holds a patent for a "Method for making a micro- or nano-scale patterned layer of material by photolithography." This invention outlines a process that includes several steps to achieve precise material patterns at a microscopic level. The patent showcases her expertise and commitment to advancing the field.
Career Highlights
Throughout her career, Jeanne has worked with esteemed institutions such as Université Paris XIII Paris-Nord Villetaneuse and the Centre National de la Recherche Scientifique. Her work in these organizations has allowed her to collaborate with leading researchers and contribute to significant advancements in her field.
Collaborations
Jeanne has collaborated with notable colleagues, including Alexis Fischer and Getachew Ayenew. These partnerships have enriched her research and expanded the impact of her inventions.
Conclusion
Jeanne Solard's contributions to photolithography exemplify her innovative spirit and dedication to scientific advancement. Her work continues to influence the field and inspire future generations of inventors.