Palo Alto, CA, United States of America

Jean-Pierre Colinge


Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1989

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2 patents (USPTO):Explore Patents

Title: The Innovations of Jean-Pierre Colinge

Introduction

Jean-Pierre Colinge is a prominent inventor based in Palo Alto, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to improving transistor performance.

Latest Patents

Colinge's latest patents include a bipolar transistor process using sidewall spacer for aligning base insert. This invention presents an improved method for fabricating bipolar transistors, which reduces base current resistance. This reduction enhances the switching frequency and current handling ability of bipolar transistors. The design features a diffusion process through an emitter contact pedestal formed on an epitaxial layer over a substrate. The method ensures reliable electrical isolation between the emitter and base insert, minimizing physical separation and providing a base current path with considerably less total resistance.

Another notable patent is the method for making patterned implanted buried oxide transistors. This process involves producing buried oxide layers in selected portions of a semiconductor substrate. It utilizes a patterned mask made from high-density material, such as tungsten, to selectively form buried oxide layers through oxygen ion implantation. The resulting MOS transistor benefits from reduced drain and source capacitance, reduced leakage, and faster response, while avoiding the floating-body effect common in other processes.

Career Highlights

Colinge is currently associated with Hewlett-Packard Company, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of transistors, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Colinge has collaborated with notable individuals in the field, including Theodore I. Kamins and Paul J. Marcoux. These collaborations have further enriched his contributions to semiconductor innovations.

Conclusion

Jean-Pierre Colinge's work exemplifies the spirit of innovation in semiconductor technology. His patents reflect a deep understanding of the challenges in the field and offer practical solutions that enhance transistor performance. His contributions continue to influence the industry and pave the way for future advancements.

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